| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which is superior in resolution, and to provide a resist pattern forming method. <P>SOLUTION: The positive resist composition contains a resin component (A), whose solubility in an alkali developer increases by acidic action and an acid generator component (B) which generates an acid upon exposure to light, wherein the component (A) contains a constitutional unit (a1), derived from a hydroxystyrene and a constitutional unit (a2) having an acetal type acid-dissociable dissolution inhibiting group, and the component (B) contains an acid generator (B1), comprising a compound represented by a cation having a 9-phenylthiocarbazole structure. <P>COPYRIGHT: (C)2009,JPO&INPIT |
