| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating device that can suppress coating liquid which is first discharged from a nozzle from being swelled and coated when starting coating processing even in a pressurization supply method and a coating method.SOLUTION: A coating device comprises: a coating liquid supply source 2 that pushes out and supplies coating liquid b to a coating liquid supply system 9 by pressurization; a nozzle 12 that is connected to the coating liquid supply system and performs coating processing; a syringe pump 20 that is provided in the coating liquid supply system, has the coating liquid filled therein, discharges the coating liquid only when starting the coating processing to supply the liquid to the nozzle, and suppresses variation in pressure which is propagated from the coating liquid supply source toward the nozzle when stopping the supply of the coating liquid to the nozzle; an opening/closing valve 13 for filling a syringe pump that is closed only when supplying the coating liquid to the syringe pump; an opening/closing valve 13a that is closed when starting the coating processing with the syringe pump and opened when supplying the coating liquid to the syringe pump and in response to stoppage of the supply of the coating liquid with the syringe pump in order to supply the coating liquid to the nozzle.SELECTED DRAWING: Figure 3 |
