发明名称 SOLAR CELL AND METHOD OF MANUFACTURING THE SAME
摘要 A solar cell includes a semiconductor substrate of a first conductive type and includes a first side and a second side, the second side having a textured structure formed on the entire second side; a first doped region of the first conductive type and a second doped region of a second conductive type on the first side; a first passivation layer on the first doped region and the second doped region and exposing a portion of a back surface of each of the first and second doped regions, the first passivation layer being formed of silicon nitride (SiNx), silicon dioxide (SiOx), or a combination thereof; a second passivation layer on the second side; an anti-reflection layer on the second passivation layer; and a first electrode electrically connected to the first doped region and a second electrode electrically connected to the second doped region.
申请公布号 US2016284899(A1) 申请公布日期 2016.09.29
申请号 US201615174500 申请日期 2016.06.06
申请人 LG ELECTRONICS INC. 发明人 LEE Sungeun;CHOE Youngho
分类号 H01L31/0224;H01L31/18;H01L31/068;H01L31/0216;H01L31/0236 主分类号 H01L31/0224
代理机构 代理人
主权项 1. A solar cell, comprising: a semiconductor substrate of a first conductive type and including a first side and a second side opposite the first side, the second side having a textured structure formed on the entire second side of the semiconductor substrate; a first doped region of the first conductive type and a second doped region of a second conductive type opposite the first conductive type on the first side of the semiconductor substrate; a first passivation layer on the first doped region and the second doped region and exposing a portion of a back surface of each of the first and second doped regions, the first passivation layer being formed of silicon nitride (SiNx), silicon dioxide (SiOx), or a combination thereof and having a single-layered structure or a multi-layered structure; a second passivation layer on the second side of the semiconductor substrate; an anti-reflection layer on the second passivation layer; and a first electrode electrically connected to the first doped region and a second electrode electrically connected to the second doped region, wherein the first and second electrodes include respectively: a metal seed layer having a first portion directly contacting one of the first doped region and the second doped region, and a second portion directly contacting the first passivation layer, a diffusion barrier layer on the metal seed layer, a first conductive layer on the diffusion barrier layer and formed by plating, the first conductive layer including a bottom surface and side surfaces, and a second conductive layer on exposed bottom and side surfaces of the first conductive layer and formed by plating, wherein the first doped region is coplanar with the second doped region.
地址 Seoul KR