| 摘要 |
The disclosure describes a low-emissivity thin film optical stacks with improved optical and infrared reflecting properties and methods of making the same. Provided is a method of making a product with a coating comprising an optical film, the method comprising depositing a first coating of the optical film that comprises silicon on at least a portion of a substrate and depositing a second coating that comprises fluorine doped tin oxide on at least a portion of the first coating, wherein the second coating is deposited at a temperature in the range of 400 to 800°C from a gas stream comprising an oxidizing agent selected from the group consisting of peroxides, nitric acid, nitrates, nitrites, nitrous oxide, sulfuric acid, sulfates, persulfates, hypochloric acid, chlorates, perchlorates, bromates, borates and combinations thereof. |
