发明名称 ELECTROSTATIC CHUCK AND ITS MANUFACTURE
摘要 <p>PURPOSE: To enable clamping force of an electrostatic chuck for an attraction between the chuck and a wafer to be improved in strength and uniformity by a method, wherein the electrostatic chuck is equipped with an electrode composed of two separated parts. CONSTITUTION: A chuck 10 has a hub 12a and a rim 12b, and the hub 12a and the rim 12b are formed in one piece and electrically connected together but insulated from a doughnut-shaped electrode 14 which is located at the center of the chuck 10. The clamping source of the chuck 10 is formed as a disk of radius R and divided into three ring-shaped regions. The ring-shaped regions are separated by boundaries, a wall 16 and an outer edge 24. The wall 16 is located at a position distant from the center by R/4, and the outer edge 24 is located at a position distant from the center by 3R/4. The clamping surface is possessed of two electrodes 12 and 14, which are isolated from each other and equal in area, and the clamping surface area of the electrodes 12 and 14 are represented by a formula, (πR<2> )/2. Furthermore, the two separate clamping surfaces are symmetrically distributed in area, so that a clamping force which is uniform and strong can be obtained.</p>
申请公布号 JPH06342843(A) 申请公布日期 1994.12.13
申请号 JP19910162412 申请日期 1991.06.07
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 JIYOSEFU SUKINAA ROOGAN;REIMONDO ROBAATO RUKERU;ROBAATO ERI TONPUKINSU;ROBAATO PIITAA UESUTAAFUIIRUDO JIYUNIA
分类号 B23Q3/15;H01L21/265;H01L21/302;H01L21/3065;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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