| 摘要 |
At least one waveguide 2,3,4 are formed on a crystal substrate 1 having an electro-optical effect. A buffer layer 5 (with a dielectric constant of 1.1 to 40) is formed on the waveguide. Lower CPW electrode structures 6,7 are formed on the buffer layer. Intermediate electrode structures 8,9 are formed thereon and additional electrode structure 10 is formed on the intermediate signal electrode 8.
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