METHOD AND DEVICE FOR HALOGEN-CONTAINING GAS TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a treatment method and device for halogen-containing gas capable of decomposing and treating a halogen compound in a high effi ciency not depending on a concentration of halogen in the halogen compound- containing gas. SOLUTION: The predetermined amount of water vapor based on a concentration of halogen in a halogen-compound-containing gas in mixed into the halogen compound-containing gas. This mixture gas is introduced to a discharge processing part 31 to decompose the halogen compound in the mixture gas. This decomposed product is removed.