| 发明名称 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 摘要 |
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack.
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| 申请公布号 |
US7300537(B2) |
申请公布日期 |
2007.11.27 |
| 申请号 |
US20040000894 |
申请日期 |
2004.12.02 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
O'DONNELL ROBERT J.;DAUGHERTY JOHN E. |
| 分类号 |
H01L21/00;H05H1/46;C23C16/00;C23C16/44;H01J37/32;H01L21/3065 |
主分类号 |
H01L21/00 |
| 代理机构 |
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