| 摘要 |
The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index n<SUB>L </SUB>and at least one liquid lens (F) made from a transparent liquid, with a refractive index n<SUB>F</SUB>. At the operating wavelength the first lens has the greatest refractive index n<SUB>L </SUB>of all solid lenses of the objective, the refractive index n<SUB>F </SUB>of the at least one liquid lens (F) is bigger than the refractive index n<SUB>L </SUB>of the first lens and the value of the numerical aperture NA is bigger than 1.
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