发明名称 CONTINUOUS PLATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a continuous plating apparatus capable of plating workpieces while changing a set current value for each workpiece. SOLUTION: In the continuous plating apparatus, when the number of the workpieces simultaneously transferred in the plating tank in a completely immersed state is N, (N+1) cathode relay members that extend in a workpiece transfer direction are arranged and (N+1) power supply units are provided outside the plating tank, anode terminals of the power supply units are connected to opposed anodes that are provided in the plating tank, cathode terminals of the power supply units are respectively connected to the cathode relay members so that power is supplied to each of the workpieces transferred in the plating tank from a corresponding power supply unit through a corresponding cathode relay member, and each of the power supply units is able to be controlled by constant current control when being transferred in the plating tank in a completely immersed state, by current gradual increase control when being carried into the plating tank in a partially immersed state, and by current gradual decrease control when being carried out from the plating tank in a partially immersed state. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009132999(A) 申请公布日期 2009.06.18
申请号 JP20080275561 申请日期 2008.10.27
申请人 ALMEX PE INC 发明人 NODA TOMOHIRO;AKAMATSU KAZUTOSHI
分类号 C25D21/12;C25D21/00;H05K3/18 主分类号 C25D21/12
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