ANODISCHES VERKLEBUNGSVERFAHREN UND VORRICHTUNG FUER ROENTGENSTRAHLMASKEN.
摘要
<p>A structure for use in an X-ray membrane (pellicle) mask is provided in which anodic bonding of layers is employed. Anodic bonding as used here provides a permanent bond between the layers, has zero thickness and provides substantial improvements in the obtained flatness of the mask by eliminating conventional glue for attachment. By applying a voltage between a layer, such as silicon, and a glass plate, and simultaneously heating both elements a permanent bond is established which is extremely flat thus providing minimum misalignment of the mask during subsequent X-ray lithography fabrication.</p>
申请公布号
DE3576003(D1)
申请公布日期
1990.03.15
申请号
DE19853576003
申请日期
1985.02.07
申请人
HEWLETT-PACKARD CO., PALO ALTO, CALIF., US
发明人
KARNEZOS, MARCOS, PALO ALTO CALIFORNIA, US;NAKANOS, HOWARD H., SUNNYVALE CALIFORNIA, US;NEUKERMANS, ARMAND P., PALO ALTO CALIFORNIA, US