ITO SPUTTERING TARGET AND ITS MANUFACTURE

摘要

PURPOSE:To realize an ITO sintered target capable of stably obtaining a high refractive index transparent ITO film of excellent performance without causing the instability of sputtering operation. CONSTITUTION:A powder metallurgical raw material essentially consisting of indium oxide and tin oxide and blended with germanium components is sintered in an oxygen atmosphere to obtain an ITO target contd., by weight 1 to 15% germanium oxide and in which density D (g/cm<3>) and bulk resistance value rho (mOMEGAcm) simultaneously satisfy the two inequalities of a) 5.50<=D<=7.23 and, b) -0.333D+2.742>=rho>=-0.283D+2.057.