| 摘要 |
A reflecting master hologram is illuminated with collimated coherent beams at an incident angle to provide regular reflected beams and diffracted beams. The regular reflected beams and the diffracted beams are directed to a reflective photoresist plate at the same angles as those at which they are, respectively, reflected by the reflecting master hologram so as to form an intensity pattern, i.e. a bright and dark pattern, of interference fringes on the reflective photoresist plate. The exposed photoresist plate is developed and etched to form a reflective hologram on the plate.
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