| 摘要 |
<P>PROBLEM TO BE SOLVED: To optimize imaging performance of a projection exposure system, comprising a lighting optical system for illuminating patterning structures and a projection optical system for imaging the region of the illuminated patterning structures on the corresponding field. <P>SOLUTION: (1) The field is assigned to a first exposure field, having a first field dimension and a first position in the maximum field which can be exposed by the projection exposure system. The optical parameter of the projection optical system is set at a first setting, so that the imaging performance in the first exposure field exhibits a first optimum performance. The field is changed to a second exposure field, having a second field dimension or/and a second position in the maximum field different from the position of the first field dimension. (3) The optical parameters are changed to a second setting, so that the imaging performance in the second exposure field exhibits a second optimum performance. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
