发明名称 |
Gas-tight article and a producing process thereof |
摘要 |
<p>A gas-tight article includes a sintered body composed mainly of a silicon carbide, and a film of silicon carbide formed on a surface of the sintered body by chemical vapor deposition and covering said surface of the sintered body, wherein cracks are formed in the film of the silicon carbide, and the cracks are filled with metallic silicon.</p> |
申请公布号 |
EP0870744(B1) |
申请公布日期 |
1999.11.17 |
申请号 |
EP19980302754 |
申请日期 |
1998.04.08 |
申请人 |
NGK INSULATORS, LTD. |
发明人 |
NISHIOKA, MASAO;AIHARA, YASUFUMI;WATANABE, KEIICHIRO |
分类号 |
C04B41/88;C04B41/52;C04B41/89;C23C16/32;C23C16/56;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):C04B41/89 |
主分类号 |
C04B41/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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