Etching process for forming a rough surface of a semiconductor,申请号EP19990101974-传众专利搜索

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发明名称	Etching process for forming a rough surface of a semiconductor
摘要
申请公布号	EP0938133(B1)	申请公布日期	2001.09.12
申请号	EP19990101974	申请日期	1999.02.01
申请人	SEZ SEMICONDUCTOR-EQUIPMENT	发明人	KOVACS, FREDERIC;KRUWINUS, HANS-JUERGEN DIPL.-ING.
分类号	H01L21/304;H01L21/306;(IPC1-7):H01L21/306	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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