| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target which uses a ZnO based oxide-containing material and is less liable to cause deterioration in a reflective layer and a recording layer adjoining thereto, and with which a thin film for an optical information recording medium (particularly, application as a protective film) having satisfactory adhesion can be deposited at high speed, and to provide a production method therefor, and the thin film for an optical information recording medium and a production method therefor, thereby to attain an improvement in characteristics of the optical information recording medium and the remarkable improvement of productivity. <P>SOLUTION: The sputtering target is composed of a material containing an oxide having a Homologous structure consisting mainly of ZnO, to which the oxide(s) of one or two kinds of elements selected from Ta and Y are added. The sputtering target composed of a material which has a Homologous structure of (In<SB>2</SB>O<SB>3</SB>)(ZnO)<SB>m</SB>, m≥1 and contains the oxide(s) of one or two kinds of elements selected from Ta and Y is provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
