| 摘要 |
PROBLEM TO BE SOLVED: To obtain the pattern of a semiconductor chip larger than the conventional one by effectively using the reticle by arranging a pattern to be transferred on the reticle at a previously set constant angle to a side of the reticle. SOLUTION: The reticle 1 has the IC chip pattern 2 arranged along a diagonal of the reticle 1. When the effective exposure are of a stepper is 22×22 mm large, the diagonal of the reticle 1 is 31.1 mm long, so the length is the maximum length of the IC chip pattern 2. Here, when the IC chip pattern 2 is arranged along the diagonal of the reticle 1, the maximum length of the IC chip pattern 2 in the long-side direction is restricted by the length of its short-side direction, but in the IC chip pattern 2 which has a large dimension ratio between its long-side length and short-side length like a liquid crystal driver LSI, the IC chip pattern 2 which has the length close to the maximum length is obtained. |
