A HIGH SENSITIVITY PHOTO-ACTIVE POLYMER AND DEVELOPERS FOR HIGH RESOLUTION RESIST APPLICATIONS,申请号KR19970022843-传众专利搜索

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发明名称	A HIGH SENSITIVITY PHOTO-ACTIVE POLYMER AND DEVELOPERS FOR HIGH RESOLUTION RESIST APPLICATIONS
摘要
申请公布号	KR100246170(B1)	申请公布日期	2000.06.01
申请号	KR19970022843	申请日期	1997.06.03
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION.	发明人	AVIRAM, ARI;POMERENE ANDREW T. S.;SEEGER DAVID EARLE
分类号	G03F7/039;G03F7/32;G03F7/38;(IPC1-7):G03F7/00	主分类号	G03F7/039
代理机构		代理人
主权项
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