| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam exposure method or the like which minimizes influence of change of blurring, which depends on pattern density, and improves imaging performance and throughput. SOLUTION: Square-sum (total blurring) of blurring (chain line) by space charge effect and blurring (broken line) by geometric aberration is shown by a solid line. When a beam current I is 5μA, it is a minimum value of 30 [nm] or thereabout at a beam spread angle of about 5.5 [mrad], and when a beam current I is 25μA, it is 92 [nm] or thereabout at about 8.0 [mrad]. Therefore, a spread angle of projection beam of an aligner is made variable in the range of 5 to 8 [mrad], for example. Thereby, total blurring at each beam current value can be made minimum.
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