COMPOSITE FOR FORMING DIELECTRIC THIN FILM, DIELECTRIC THIN FILM USING THE SAME, THIN FILM CAPACITOR, SEMICONDUCTOR DEVICE, AND METHOD OF FORMING DIELECTRIC THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a composite for forming a thin film consisting of strontium titanate and manganese additive strontium titanate which are homogenous to suppress occurrence of micro-cracks along a grain boundary, with which the thin film of satisfactory surface morphology is formed, which does not deteriorate operation environment, and which is excellent in stability; and also to provide a method of forming the thin film using them.

SOLUTION: The characteristic of the composite for forming the thin film of strontium titanate is obtained by dissolving or reacting at least one kind selected from a group of strontium metal, strontium alkoxide and strontium carboxylate, titanium alkoxide, and the acid anhydride of monocarboxylic acid and/or carboxylic acid in an organic solvent containing alcohols by ≥60 % mass. Furthermore, the characteristic of the composite for forming the thin film of manganese additive strontium titanate is obtained by dissolving or reacting manganese material in the composite for forming the thin film of strontium titanate.

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