发明名称 Selektiv sammansättning av ett material
摘要 The invention relates to a method of selective doping of a material by a) radiating a predetermined pre-treated pattern/region into the material, b) treating the material for producing reactive groups in the pre-treated pattern/region, and c) doping the material by the atomic layer deposition method for producing a pattern/region doped with a dopant in the material. The invention further relates to a selectively doped material, a system for preparing a selectively doped material, and use of said method.
申请公布号 FI20040876(A) 申请公布日期 2005.12.25
申请号 FI20040000876 申请日期 2004.06.24
申请人 BENEQ OY, 发明人 RAJALA,MARKKU;PUTKONEN,MATTI;PIMENOFF,JOE;NIINISTOE,LAURI;PAEIVAESAARI,JANI;KURKI,JOUKO
分类号 C03C;C03C21/00;C03C23/00;C23C;C23C16/02;C23C16/40;C23C16/455;C30B25/02;C30B31/08;C30B31/16;(IPC1-7):C23C 主分类号 C03C
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