发明名称 |
Selektiv sammansättning av ett material |
摘要 |
The invention relates to a method of selective doping of a material by a) radiating a predetermined pre-treated pattern/region into the material, b) treating the material for producing reactive groups in the pre-treated pattern/region, and c) doping the material by the atomic layer deposition method for producing a pattern/region doped with a dopant in the material. The invention further relates to a selectively doped material, a system for preparing a selectively doped material, and use of said method. |
申请公布号 |
FI20040876(A) |
申请公布日期 |
2005.12.25 |
申请号 |
FI20040000876 |
申请日期 |
2004.06.24 |
申请人 |
BENEQ OY, |
发明人 |
RAJALA,MARKKU;PUTKONEN,MATTI;PIMENOFF,JOE;NIINISTOE,LAURI;PAEIVAESAARI,JANI;KURKI,JOUKO |
分类号 |
C03C;C03C21/00;C03C23/00;C23C;C23C16/02;C23C16/40;C23C16/455;C30B25/02;C30B31/08;C30B31/16;(IPC1-7):C23C |
主分类号 |
C03C |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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