| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. for far UV exposure for lithography which uses a stepper-type exposure device with far UV rays as the exposure light, by incorporating a specified photoacid producing agent and a resin having substituents which increase the solubility by acid for an alkali developer and specifying the optical density for far UV exposure. SOLUTION: This compsn. contains a photoacid producing agent expressed by formulae I to VII and a resin having substituents which increase the solubility by acid for an alkali developer, and the compsn. is formed to obtain <=0.40μm<-1> optical density for exposure light of 170 to 220nm wavelength per 1.0μm thickness of the film. In formula I to VII, R1 R4 , R7 , R8 , R17 to R20 are independently alkyl groups, substd. alkyl groups, cycloalkyl groups, or substd. cycloalkyl groups, A is -SO2 - or -CO-, R5 , R6 , R9 , R10 , R15 , R16 are independently hydrogen atoms, alkyl groups, substd. alkyl groups, etc., and m is 1 or 2. |
