| 摘要 |
PROBLEM TO BE SOLVED: To suppress changes in the concentration of chemical liquid due to interfusion of rinse liquid, when the chemical liquid splashed from a substrates is recovered with a cup for cyclic use. SOLUTION: The substrate-processing device comprises a chemical-liquid recovering cup 15 on the outside of a spindle of substrate W, while comprising a rinse liquid recovering cup 16 on the inside. An opening 15a of the cup 15 is provided on the upper side along the rotation axis of the substrate W, while an opening 16a of the cup 16 provided on the lower side. An intermediate cup wall 30 for separating the cups 15 and 16 is allowed to rise/fall. In a chemical liquid processing, the intermediate cup wall 30 is lowered, and the chemical liquid is recovered with the cup 15. Meanwhile, for a rinse liquid process, the intermediate cup wall 30 is raised to stop an opening 15a, while the opening 16a on the lower side is opened wide for recovering the rinse liquid with the cup 16. The opening 15a stopped at rinse liquid process is at a position higher than that of the substrate W, so that no rinse liquid will penetrate into the cup 15 for recovering chemical liquid.
|
