发明名称 |
Devices and methods for etch loading planar lightwave circuits |
摘要 |
This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
|
申请公布号 |
US2002168860(A1) |
申请公布日期 |
2002.11.14 |
申请号 |
US20010902960 |
申请日期 |
2001.07.10 |
申请人 |
WON JONGIK;KUEN HO CALVIN KA;ZHONG FAN;ZHAO LIANG |
发明人 |
WON JONGIK;KUEN HO CALVIN KA;ZHONG FAN;ZHAO LIANG |
分类号 |
G02B6/12;G02B6/136;G02B6/28;G02B6/34;(IPC1-7):H01L21/311 |
主分类号 |
G02B6/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|