发明名称 Substrate conductive post formation
摘要 A substrate with at least one conductive post formed prior to the formation of an inter-layer dielectric (ILD) coating on the substrate. The conductive post may be formed from a metal layer of the substrate. Additionally, the conductive post may be built up on the substrate.
申请公布号 US7358116(B2) 申请公布日期 2008.04.15
申请号 US20020134951 申请日期 2002.04.29
申请人 INTEL CORPORATION 发明人 COOMER BOYD L.
分类号 H01L21/44;H01L21/48;H05K3/24;H05K3/46 主分类号 H01L21/44
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