| 摘要 |
<p>Disclosed are: a material for the formation of a conductive anti-reflection film, which can prevent the reflection of UV ray, has excellent antistatic effect and a high sensitivity, can prevent the accumulation of charge even when exposed to a light such as electron beam, is free of the concern about pattern defect or misalignment, and enables the formation of a high-resolution and fine resist pattern, wiring pattern or the like at a low cost, in a simple manner and with high efficiency; and others. The material comprises at least a base resin having a conductivity, a cross-linking agent, a thermal acid generator and a solvent.</p> |
