| 摘要 |
The present invention relates to an exposure apparatus which can accurately expose a substrate portion to light. The exposure apparatus comprises: an optical system which exposes a peripheral region of the substrate to light, and irradiates the substrate with the light; a stage which is formed to hold and support the substrate, and to move in a direction for setting the location of the substrate in a direction perpendicular to an optic axis of the optical system; and a controller which is formed to move the stage. The controller moves the stage based on the information about telecentricity and the distance between the optical system and the peripheral region in a direction which is parallel to the optic axis of the optical system so as to irradiate a predetermined portion on the substrate with the light from the optical system. |
