发明名称 FOCUSED ION BEAM APPARATUS
摘要 The present invention relates to a focused ion beam apparatus for stably and continuously emitting ions emitted from a gas electric field ionization ion source with higher brightness along an optical axis of an ion optical system for a long time so as to form focused ion beam for a long time. An emitter forms sharped iridium and heterogeneous metal fine wire in a fixed shape with regard to the focused ion beam apparatus equipped with gas electric field ionization ion source having the emitter to emit the ions.
申请公布号 KR20160095621(A) 申请公布日期 2016.08.11
申请号 KR20160010563 申请日期 2016.01.28
申请人 HITACHI HIGH-TECH SCIENCE CORPORATION 发明人 YASAKA ANTO;KOZAKAI TOMOKAZU;MATSUDA OSAMU;SUGIYAMA YASUHIKO;AITA KAZUO;ARAMAKI FUMIO;OBA HIROSHI
分类号 H01J1/304;H01J9/02 主分类号 H01J1/304
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