发明名称 |
FOCUSED ION BEAM APPARATUS |
摘要 |
The present invention relates to a focused ion beam apparatus for stably and continuously emitting ions emitted from a gas electric field ionization ion source with higher brightness along an optical axis of an ion optical system for a long time so as to form focused ion beam for a long time. An emitter forms sharped iridium and heterogeneous metal fine wire in a fixed shape with regard to the focused ion beam apparatus equipped with gas electric field ionization ion source having the emitter to emit the ions. |
申请公布号 |
KR20160095621(A) |
申请公布日期 |
2016.08.11 |
申请号 |
KR20160010563 |
申请日期 |
2016.01.28 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORPORATION |
发明人 |
YASAKA ANTO;KOZAKAI TOMOKAZU;MATSUDA OSAMU;SUGIYAMA YASUHIKO;AITA KAZUO;ARAMAKI FUMIO;OBA HIROSHI |
分类号 |
H01J1/304;H01J9/02 |
主分类号 |
H01J1/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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