发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus consuming a small amount of energy and having high productivity.SOLUTION: A vacuum processing apparatus comprises: a plurality of processing units which includes a vacuum case and a sample stage that is disposed in a processing chamber arranged in its inner part and onto which a processing target sample is mounted, and allows the sample to be processed by using a plasma formed in the processing chamber, and a chiller that is connected with a coolant passage disposed in the sample state in the processing unit, supplies a coolant adjusted to a predetermined temperature and circulates it. The apparatus also comprises: a circulation passage in which the coolant is discharged from the chiller and then branched to be supplied to the coolant passage of the plurality of sample stages, and is returned to the chiller after the coolant is flowed from each of the coolant passages of the sample stages and is joined together; and another circulation passage in which the coolant is discharged from the chiller, that bypasses a branching part, the plurality of sample stages, and a confluence part, and that is returned.SELECTED DRAWING: Figure 4
申请公布号 JP2016162794(A) 申请公布日期 2016.09.05
申请号 JP20150037608 申请日期 2015.02.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SATO KOHEI;TAUCHI TSUTOMU;MARUYAMA EIJI;UEMURA TAKASHI
分类号 H01L21/3065 主分类号 H01L21/3065
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