Projection exposure apparatus for microlithography for the production of semiconductor components

摘要

A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

主权项

1. An apparatus, comprising:
an optical assembly comprising:
an optical element;an actuator configured to mechanically actuate the optical element;a sensor configured to sense the optical element; anda first device integrated with the optical assembly; and a second device selected from the group consisting of a device configured to provide control signals to the sensor, a device configured to transmit energy to the sensor in a contactless manner, and combinations thereof, wherein:
the first device is configured to actuate the optical element via the actuator independently of the second device;the second device is configured to introduce no parasitic mechanical effects into the optical assembly at least during specific operating states of the apparatus; andthe apparatus is a microlithography projection objective.