发明名称 SUBSTRATE STAGE AND ALIGNER USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To reduce the size of a substrate transportation mechanism by improving various substrate stages used for an exposure device, etc. SOLUTION: Related to a sensitized substrate stage 1 of an exposure device A, a new substrate transportation arm 7 is attached to a substrate holder 6. The substrate transportation arm 7 is reciprcically moved in vertical direction Z by a substrate movement/exchange driving device 8 when overlapped with the substrate holder 6 for delivery of a sensitized substrate W to the substrate holder 6, while reciprocally moved in back and forth direction X relative to the substrate holder 6 by a substrate transportation driving device 9 for protruding above the substrate holder 6. While the substrate transportation arm 7 is overlapped with the substrate holder 6 inside it, a installation space of the substrate transportation arm 7 is not required outside the substrate holder 6, while a space s between them is smaller when a sensitized substrate movement/exchange part 4 approaches the sensitized substrate stage 1.</p>
申请公布号 JPH11233408(A) 申请公布日期 1999.08.27
申请号 JP19980029879 申请日期 1998.02.12
申请人 NIKON CORP 发明人 KOITABASHI HIDEKI
分类号 G03F7/20;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址