发明名称 |
RESIST COMPOSITION FOR DEEP ULTRAVIOLET LIGHT |
摘要 |
<p>A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.</p> |
申请公布号 |
KR100249254(B1) |
申请公布日期 |
2000.06.01 |
申请号 |
KR19950006580 |
申请日期 |
1995.03.27 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO.,LTD.;WAKO PURE CHEMICAL INDUSTRIES LTD. |
发明人 |
URANO, FUMIYOSHI;YASUDA, TAKANORI;KATSUYAMA, AKIKO;YAMASHITA, KAZIHIRO |
分类号 |
G03F7/004;G03F7/039;G03F7/09;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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