| 摘要 |
In a process chamber assembly and a processing apparatus for processing a substrate using, a process chamber assembly may include a process chamber including a body having a first contact face and a cover for covering the body having a second contact face, the second contact face of the cover seals the body at the first contact face thereof forming a buffer space therebetween, and at least one combining unit in fluid communication with the buffer space and configured to provide vacuum therein.
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