发明名称 WASHING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a washing method by which a mold for a multiple lens arrays after continuous uses can be washed simply and easily. <P>SOLUTION: The whole surface of a die for a multiple lens array is immersed in a solvent containing practically no surfactant and having a relative evaporation speed (ASTM-D3539) of 1-6 and is irradiated with ultrasonic waves. Ethanol or acetone is preferably used as the solvent. Contaminants adhered to the molding surface of the mold (especially at the corner) can be removed in a short period. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007217234(A) 申请公布日期 2007.08.30
申请号 JP20060040488 申请日期 2006.02.17
申请人 SEIKO EPSON CORP 发明人 KITAMURA KEIKO
分类号 C03B11/00;B08B3/12;B08B9/28;B29C33/72;B29L11/00 主分类号 C03B11/00
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