| 摘要 |
A process for the preparation of thin films of an organic-inorganic nature comprising growing with a gas phase deposition technique preferable the ALCVD (atomic layer chemical vapour deposition) technique. As an example, trimethylaluminium (TMA), hydroquinone (Hq) and phloroglucinol (PhI) have been used as precursors to fabricate thin films of aluminium benzene oxides constructing a hybrid type film. Further thin films with a hybrid nature are described. These films can be used as an optical material, a pressure sensor, a gas sensor, temperature sensor, magnetic field sensor, electric field sensor, a piezoelectric material, a magnetic material, a semiconductor material and as an electric insulating material. |
