发明名称 Salt suitable for an acid generator and a chemically amplified resist composition containing the same
摘要 The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q<SUP>1 </SUP>and Q<SUP>2 </SUP>each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A<SUP>+</SUP> represents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
申请公布号 US7301047(B2) 申请公布日期 2007.11.27
申请号 US20060586640 申请日期 2006.10.26
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 YOSHIDA ISAO;HARADA YUKAKO;YAMAGUCHI SATOSHI
分类号 C07C69/00 主分类号 C07C69/00
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