| 摘要 |
A projection aligner includes an illumination optical system which irradiates a mask pattern with an exposure light, an exposure optical system which irradiates a substrate on a stage with the exposure light passed by the illumination optical system, and a correction optical system including two correction filters for correcting the illuminance irregularity of the exposure light. The correction filters have a light transmission irregularity which is opposite to the illuminance irregularity of the projection aligner. The two correction filters are shifted from each other so that the transmittance distributions of both the correction filters are shifted from one another.
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