发明名称 |
CHEMICALLY AMPLIFIED RESIST COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition giving good line edge roughness while retaining high resolution. <P>SOLUTION: The chemically amplified resist composition comprises: a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit having a lactone structure represented by a specific structure in a side chain, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and at least two acid generators represented by a specific structure. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008209917(A) |
申请公布日期 |
2008.09.11 |
申请号 |
JP20080019027 |
申请日期 |
2008.01.30 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
TAKADA YOSHIYUKI;YAMAMOTO SATOSHI;YAMAGUCHI NORIFUMI |
分类号 |
G03F7/039;C08F220/28;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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