发明名称 CHEMICALLY AMPLIFIED RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition giving good line edge roughness while retaining high resolution. <P>SOLUTION: The chemically amplified resist composition comprises: a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit having a lactone structure represented by a specific structure in a side chain, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and at least two acid generators represented by a specific structure. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008209917(A) 申请公布日期 2008.09.11
申请号 JP20080019027 申请日期 2008.01.30
申请人 SUMITOMO CHEMICAL CO LTD 发明人 TAKADA YOSHIYUKI;YAMAMOTO SATOSHI;YAMAGUCHI NORIFUMI
分类号 G03F7/039;C08F220/28;G03F7/004;H01L21/027 主分类号 G03F7/039
代理机构 代理人
主权项
地址