| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique which allows for highly accurate control of secular change in the discharge quantity of a chemical discharged from a nozzle, in a liquid processing method performing liquid processing by supplying a chemical to a substrate.SOLUTION: The method of present invention performs: a step S1 for discharging a chemical, supplied from a pump to a nozzle, from the nozzle and forming a liquid flow; a step S2 for imaging a region where the liquid flow is formed repeatedly, and acquiring image data; a step S3 for acquiring data about the secular change in the discharge quantity of the chemical from the image data; and a step for detecting whether or not there is an abnormality in the secular change, based on the data about the secular change and reference data, before dealing with the abnormality are carried out.SELECTED DRAWING: Figure 12 |
