| 摘要 |
PURPOSE:To accurately align a plurality of objects (e.g. a mask and a wafer). CONSTITUTION:The aligning apparatus comprises an alignment detector (2) for detecting deviations of a mask 4 and a wafer 6 from specified positional relationship (relationship in which an alignment is performed), a stage mechanism 13, etc., for relatively moving the wafer 6 to the mask (4), and interference measuring means 9, 10, 11, 12 for measuring moving information of the mechanism 13, etc., and obtains a detected value of the detector and measured values of the means 9, 10, 11, 12 at the same timing. The apparatus is constituted to so obtain an operation command value to the mechanism 13, etc., that the positional relationship between the mask 4 and the wafer 6 becomes the specified positional relationship is obtained based on the obtained values to move a stage according to the command value. |
