CLEANING DEVICE AND CLEANING METHOD

摘要

A novel cleaning technique for cleaning a flat surface of an object to be cleaned is provided. The technique is particularly suitable for cleaning an object, such as a wafer, having easily broken minute structures formed on it. A cleaning device for cleaning a flat surface of an object to be cleaned has a structure capable of transmitting an ultrasonic wave and ultraviolet light and having a flat surface facing the flat surface of the object, an ultrasonic transducer and ultraviolet light irradiation device for irradiating the surface of the object, a mechanism for holding the surface of the structure such that the surface is parallel to and spaced a specific distance from the surface of the object, and a cleaning liquid supply mechanism for supplying a cleaning liquid to a space between the two surfaces.