| 摘要 |
A method for manufacturing an MEMS torsional electrostatic actuator comprises: providing a substrate (10), wherein the substrate (10) comprises a first silicon layer (100), a buried oxide layer (200) and a second silicon layer (300) that are sequentially stacked; patterning the first silicon layer (100) and exposing the buried oxide layer (200) to form a rectangular upper plate (120) separated from a peripheral region (140), wherein the upper plate (120) and the peripheral region (140) are connected by only using a cantilever beam (130), and forming, on the peripheral region (140), a recessed portion (110) exposing the buried oxide layer (200); patterning the second silicon layer (300) and exposing the buried oxide layer (200) to form a back cavity (310), wherein the back cavity (310) is located in a region of the second silicon layer (300) corresponding to the upper plate (120), covers 40% to 60% of the area of the region corresponding to the upper plate (120), and is close to one end of the cantilever beam (130); exposing the second silicon layer (300), and suspending the upper plate (120) and the cantilever beam (130); and respectively forming an upper contact electrode (400) and a lower contact electrode (500) on the second silicon layer (300). |
