PATTERN MEASURING DEVICE, METHOD FOR EVALUATING HIGH-MOLECULAR COMPOUND USED IN SELF-ORGANIZATION LITHOGRAPHY, AND COMPUTER PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a pattern measuring device evaluating such a random pattern as a finger print pattern quantitatively and precisely, a method for evaluating a high-molecular compound used in self-organization lithography, and a computer program.SOLUTION: In a method for evaluating a high-molecular compound used in self-organization lithography, a center line 703 of a pattern 701 is extracted from an image of a finger print pattern, for example, measuring 710 is conducted on the pattern for a plurality of positions of the center line 703, and at least one of the histogram of the measurement results of the positions and the roughness of the pattern is obtained based on the measurement results of the pattern.SELECTED DRAWING: Figure 7