发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. |
申请公布号 |
US2016349629(A1) |
申请公布日期 |
2016.12.01 |
申请号 |
US201615237394 |
申请日期 |
2016.08.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZAAL Koen Jacobus Johannes Maria;OTTENS Joost Jeroen |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Veldhoven NL |