发明名称 |
DATA VERIFICATION METHOD FOR DATA CONVERTING APPARATUS |
摘要 |
A method of verifying electron beam data used to produce a photomask comprises dividing design data for the photomask into a plurality of repetitive regions, sequentially converting the sequential regions into electron beam data, and determining whether electron beam data corresponding to a current repetitive region is substantially identical to electron beam data corresponding to a previous repetitive region. |
申请公布号 |
KR20060039364(A) |
申请公布日期 |
2006.05.08 |
申请号 |
KR20040088510 |
申请日期 |
2004.11.02 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JANG, SUNG HOON;AHN, BYOUNG SUP;NO, YOUNG HWA |
分类号 |
H01L21/027;G03F1/20;G03F1/78;G03F1/86;H01L21/66 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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