| 摘要 |
PROBLEM TO BE SOLVED: To obtain a coating compsn. for a positive type photoresist depositing no photosensitive component, excellent in solubility, properties of a coating film and shelf stability and capable of forming a resist pattern having a good sectional shape. SOLUTION: An alkali-soluble resin and a quinonediazido group-contg. compd. are dissolved in a carbonic ester-contg. org. solvent to obtain the objective coating compsn. for a positive type photoresist. The carbonic ester is, e.g. dimethyl carbonate or diethyl carbonate. The coating compsn. is applied on a substrate to form a photosensitive layer, this photosensitive layer is irradiated in accordance with a pattern to be formed and the irradiated layer is developed with an alkali developer to form the objective positive type resist pattern. |
