| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing the leakage or residue of liquid. <P>SOLUTION: This exposure apparatus comprises a first stage ST1 and a second stage ST2 independently movable in the XY plane on the image surface side of a projection optical system PL, a drive mechanism for moving the first and second stages together in a state they are in proximity to or contact with each other, and a liquid immersion mechanism for forming a liquid immersion region according to the liquid on the upper surface of at least one stage of the first and second stages. When the liquid immersion region is moved from the upper surface of one stage to the upper surface of the other stage, the upper surface of the one stage is made higher than that of the other stage. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
