| 摘要 |
PURPOSE: A vertical-type furnace for manufacturing semiconductor is provided to prevent damage to a wafer and the equipment and to eliminate the need for an operator's manual check, by immediately detecting if the wafer is not properly placed in a boat. CONSTITUTION: A vertical-type furnace for manufacturing semiconductor comprises a tube, a heater wall material, an exhaust port, a gas nozzle, a boat and a load lock chamber. The heater wall material transfers heat to the tube. The gas nozzle supplies a source gas to the tube. The exhaust port exhausts a reaction gas of the tube. The boat mounts a wafer and transfers the wafer to the tube. The load lock chamber is a space where the wafer is supplied from the exterior before the boat is inserted into the tube, and has an apparatus for transferring the wafer.
|
