METHODS FOR FABRICATING HIGH ASPECT RATIO PROBES AND DEFORMING HIGH ASPECT RATIO NANOPILLARS AND MICROPILLARS

摘要

Methods for fabricating of high aspect ratio probes and deforming micropillars and nanopillars are described. Use of polymers in deforming nanopillars and micropillars is also described.

主权项

1. A method for fabricating an array of high aspect ratio probes, comprising:
providing a substrate; coating the substrate with a first resist; defining high aspect ratio nanopillars by lithographically patterning the first resist, thus forming a patterned first resist; developing, with a developer, the patterned first resist to remove portions of the first resist on the substrate, thus forming a developed first resist and exposing portions of the substrate; depositing an etch mask on the developed first resist and the exposed portions of the substrate to mask the exposed portions of the substrate; placing the substrate in a chemical bath to dissolve, by way of chemical reactions, the developed first resist and the deposited etch mask on the developed first resist such that the deposited etch mask on the substrate remains undissolved; and performing an etch with a SF6/C4F8 etch, thus establishing high aspect ratio nanopillars.